The S-3400N Type II scanning electron microscope was manufactured by Hitachi High-Technologies Corp., (www.hitachi-hta.com), Pleasanton, CA.  Applications include topographical and compositional imaging of sputter-coated/non-coated, conductive/non-conductive bulk or microscopic samples mounted on a variety of sample stubs under high vacuum or low vacuum conditions in the specimen chamber. 

Specifications:

• Spatial resolution, 3 nm at 30 kV (high vacuum mode),
• 10 nm at 3 kV (high vacuum mode), 4 nm at 30 kV (low vacuum mode)
• Accelerating voltages- 0.3 kV to ~30 kV
• Specimen stage- 100 mm x translation, 50 mm y translation, 65 mm z range,
• Rotation range 360⁰, tilt range -20 to 90⁰
• Magnification range- 5x to 300,000x

Features:

• Energy dispersive x-ray microanalysis system (Noran System Six 300, Thermo Electron Corp., Madison, WI)
• Eucentric, 5 axes motorized stage
• Secondary electron detector
• Backscatter detector
• Variable pressure environment mode
• Peltier specimen cold stage MK3, (Deben, Ltd)
• Automatic alignments, focus control and stigmation

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